Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings
نویسندگان
چکیده
منابع مشابه
A Review on Titanium Nitride and Titanium Carbide Single and Multilayer Coatings Deposited by Plasma Assisted Chemical Vapor Deposition
In this paper, we reviewed researches about the titanium nitride (TiN) and titanium carbide (TiC) single and multilayer coatings. These coatings were deposited by the plasma assisted chemical vapor deposition (PACVD) technique. Plasma-based technologies are used for the processing of thin films and coatings for different applications such as automobile and aerospace parts, computer disc drives,...
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ژورنال
عنوان ژورنال: Archives of Metallurgy and Materials
سال: 2015
ISSN: 2300-1909
DOI: 10.1515/amm-2015-0228